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 NameCategory1st responsible2nd responsibleManufacturerModel
View FOURNITURE ( FOURN)Support salle blancheHugues GranierMonique DilhanLAASFourniture
View WAFERS / SUBSTRATS ( FOURN)Photolithographie / PhotolithographyAdrian Labordequentin gravelierTEAMSubstrats
View wet bench for harmless chemistry NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauCoillardto be checked
View AAS (E-CARA)Electrochimie/electroplatingDavid BourrierJustine BonneauPerkin ElmerAAnalyst 400 AA
View AC450CT Pulvérisation (D-PRST) NoMOSPVDLudovic SalvagnacGuillaume LibaudeAlliance ConceptAC450CT
View acid wet bench for multicleaning and etching NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauPTS092018-001
View AFM ICON (C- AFM)Caractérisation / characterizationBenjamin ReigEmmanuelle DaranBRUKERDimension ICON
View ALCATEL P1 MOS (G-DRIE)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolALCATEL-ADIXENAMS4200-P1
View ALCATEL P4 NoMOS (G-DRIE)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolAlcatel - AdixenAMS4200
View ALD MOS COMPATIBLE (T- CVD)ALDPascal Dubreuilscheid emmanuelCambridge NanotechFiji F200
View ALD NoMOS (T-CVD)ALDPascal Dubreuil BENEQTFS-200-232
View ALD-NoMOS (T- CVD)ALDPascal Dubreuilscheid emmanuelSentechSi-ALD-LL ALD024
View Aligneur Suss MOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotSUSSBA8
View Altadrop NOMOS (J- JET)Jet d'encre / ink jetfabien mesnilgrenteVéronique ConédéraAltatechAltadrop
View ApSy E100 (D-PRST) NoMOSPVDLudovic SalvagnacGuillaume LibaudeApplication SystemesE100
View Auroless (E-MANU)Electrochimie/electroplatingDavid BourrierJustine BonneauMinaservices4"
View balance NOMOS (F-FRAI)Caractérisation / characterizationfabien mesnilgrenteVéronique ConédéraMettlerAE100
View Batch Buffer Oxide Etching 1-7 MOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneaucybernétixF143 4257
View Boucle de refroidissementSupport salle blanchequentin gravelierAdrian LabordeSPIEXXX
View Capteurs sécurité gazSupport salle blancheEric Imbernonlaurent bouscayrolHoneywell Satellite XT
View carotteuse ultra sonique MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel Charlotfishione170
View Centrale Eau DISupport salle blancheHugues GranierDavid BourrierC2RLAAS 2005
View Ceradrop NOMOS (J- JET)Jet d'encre / ink jetfabien mesnilgrenteVéronique ConédéraCeradropF-Series
View clean wet bench organic solvents NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauDV TechHotte
View Cvs (E-CARA)Electrochimie/electroplatingDavid BourrierJustine BonneauMetrhomCvs
View D8-Discover (M- DRX)Epitaxie / EpitaxyAlexandre Arnoultquentin gravelierBruker AXSD8-Discover (Da Vinci)
View Découpe Graphtec (A-MONT)Assemblage / Device mountingSamuel Charlot GraphtecFC8600
View DIENER plasma O2 MOS (F-FRAI)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolDIENERNano
View Differential Scanning Calorimetry (C- DSC)Caractérisation / characterizationBenjamin Reig NETZSCHDSC 404 F3 Pegasus
View Digidrop (F-FRAI)Caractérisation / characterizationBenjamin Reigfabien mesnilgrenteGBX InstrumentDigidrop
View DILASE 3D HR NoMOS (L- 3D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinKLOEDilase 3D
View DILASE 3D MR NoMOS (L- 3D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinKLOEDilase 3DMR
View DILASE 650 NoMOS (L- 2D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinKLOEDILASE 650
View DILASE 750 NoMOS(L- 2D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinKLOEDILASE 750
View DWL 200 NoMOS(L- DWL)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinHEIDELBERG INSTRUMENTSDWL 200
View ECR PECVD NoMOS (T-CVD)PECVDPascal DubreuilJean Christophe MarrotRoth&RauAK400
View Ellipsometre EP4Caractérisation / characterizationBenjamin ReigMairame DialloAccurionNanofilm EP4
View Ellipsomètre HJY (C-SPEC)Caractérisation / characterizationBenjamin ReigEric ImbernonHoriba Jobin YvonUvisel
View encolleuse (A-MONT)Integration/ Device mountingSamuel CharlotSamuel CharlotJanomeGLT JR2400N
View Etuve Horo (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotHORO250
View étuve MEMMERT (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotMemmertUFB400
View Etuve TETHYS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotTETHYSFisher-Band
View étuve Thermox (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel CharlotThermo scientificVacutherm
View Etuve vieillissement thermique (A-MONT)Integration/ Device mountingSamuel CharlotSamuel CharlotSecasiBC21
View EVA 600 Evaporation (D-PRST) NoMOSPVDLudovic SalvagnacGuillaume LibaudeAlliance ConceptEVA 600
View EVG120 Automated Resist Processing System MOS and NoMOS (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeEVG120
View FC150 MOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotSETFC150
View Fer à souder Weller (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel CharlotWellerWSD81
View FIB Dual Beam (C- FIB)Caractérisation / characterizationBenjamin ReigMairame DialloFEIHelios 600i
View Film monter UH-115 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotUltron Systems, Inc.UH-115
View Form 3 (L- 3D)Assemblage / Device mountingSamuel CharlotRémi CoursonFormlabsForm 3
View Four AET Bore MOS Compatible (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotAETFour d'oxydation
View Four AET Phosphore (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotAETFour d'oxydation
View Four AET Propre MOS Compatible (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotAETFour d'oxydation
View Four Alox (T-FOUR)Oxydation Guilhem Almuneau AETFour d'oxydation
View Four de refusion NOMOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotMadellTYR108C
View Four DIFPHOS6 MOS Compatible (T-FOUR)redistribution, diffusionEric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four OXYBORE6 MOS Compatible (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four OXYNIT6 MOS COMPATIBLE (T- CVD)LPCVDEric ImbernonPascal DubreuilCentrothermCentronic E1550HT
View Four OXYPHOS6 MOS Compatible (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four OXYPROP6 MOS Compatible (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four RECUIT6 MOS Compatible (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four SI3N46 MOS COMPATIBLE (T- CVD)LPCVDEric ImbernonPascal DubreuilCentrothermCentronic E1550HT
View Four SIPOLY6 MOS COMPATIBLE (T- CVD)LPCVDEric ImbernonPascal DubreuilCentrothermCentronic E1550HT
View Four Tempress Si-poly MOS COMPATIBLE (T- CVD)LPCVDPascal DubreuilEric ImbernonTempressDépot LPCVD
View FTIR (C-SPEC)Caractérisation / characterizationBenjamin ReigJean-Baptiste DoucetBRUKERTENSOR 27
View fume hood exploratory chemistry NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine Bonneauto be precisedto be checked
View GenISys lab (LOGICI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeGenISys Lab v4.7.0
View Gérard Bauzil roomRobots humanoïdesOlivier STASSEGuilhem SaurelN/AN/A
View Glove box for HF based chemistry NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauDVTECHto be checked
View Gravure KOH (E-ANIS)Procédés humides / Wet process benchesDavid BourrierJustine BonneauMinaservicesKOH
View Gravure TMAH (E-ANIS)Procédés humides / Wet process benchesDavid BourrierJustine BonneauMinaservicesTMAH
View Grinder G&N MOS (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotGrinderMPS2 R300 D CS
View HMDS Primer Obducat MOS and NoMOS (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeObducat Solar Semi QS V 200 BM 200°C
View HMDS Primer oven MOS (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeYesYes
View HMP 90 NoMOS (L- DWL)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinSUSSHMP 90
View HMX NoMOS (L-DWL)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinSUSSHMX
View Hotplate automated SU8 n°1 NoMOS (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecHP
View Hotplate automated SU8 n°2 NoMOS (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecHP
View Hotplate automated Thick Resists NoMOS (F-FRAI)Photolithographie / PhotolithographyAdrian LabordeLaurent MazenqOsirisHB20e
View Hotte implanteur (F-FRAI)ImplantationEric ImbernonJean Christophe MarrotMinaserviceHotte
View Hotte Litho laser NoMOS (F-FRAI)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinDV TechPaillasse
View hotte montage (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel Charlotunknouwnunknouwn
View Hotte nano NoMos (F-FRAI)Nano imprintFranck CarcenacJean-Baptiste DoucetDVTEchHotte nano
View Hotte polissage (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel Charlotunknouwnunknouwn
View hotte solvants (F-FRAI)Integration/ Device mountingSamuel CharlotSamuel CharlotMina servicesinox
View Hotte Wafer Bonder (F-FRAI)Integration/ Device mountingSamuel CharlotSamuel CharlotDevetekno model
View HRP2-N14Robots humanoïdesOlivier STASSE KawadaHRP2
View ICP2 NoMos (G- ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolTrikon (SPTS)Omega 201 (1996)
View ICP3 NoMos (G- ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolTrikon (SPTS)Omega 201 (1994)
View ICPECVD MOS COMPATIBLE (T- CVD)PECVDJean Christophe MarrotPascal DubreuilOxfordPlasmalab 100 - HDPECVD
View Implanteur ionique IMC 200 MOS Compatible (I-IMPL)ImplantationEric ImbernonJean Christophe MarrotEatonNV 4206
View Jauge de mesure d'épaisseur MOS (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechSYLVAC CH-1023 Crissier
View left organic solvents fume hood with lowerable window NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauFluidairto be checked
View Mask Aligner Suss MA150 MOS and NoMOS (P-PHOT)Photolithographie / PhotolithographyAdrian LabordeLaurent MazenqSuss Microtec150 CC
View Mask Aligner Suss MA6 Gen4 MOS and NoMOS (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecMABA6Gen4
View Mask Aligner Suss MA6 NoMOS (P-PHOT)Photolithographie / PhotolithographyAdrian LabordeLaurent MazenqSuss Microtec6
View MASQUES/MASKS ( FOURN)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinTEAMMasques
View MBE412 (M- EJM)Epitaxie / EpitaxyAlexandre Arnoultquentin gravelierRIBER SAMBE412
View MEB S-3700N (C- MEB)Caractérisation / characterizationBenjamin ReigMairame DialloHITACHIS-3700N
View MEB S-4800 (C- MEB)Caractérisation / characterizationBenjamin ReigMairame DialloHITACHIS-4800
View Mesure planéité MOS (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechGI20
View Micro Injecteur (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotNarishigeIM 300
View Microscope leica photo auto (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeLeicaDM4000M
View Microscope leica photo manuel (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeLeicaDM-4000M
View Microscope optique Leica (F-FRAI)Caractérisation / characterizationBenjamin ReigAvatar BenjaminLEICADM4000
View Micro-soudeuse KnS 4526 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa4526
View Micro-soudeuse KnS 4700 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa4700
View Micro-soudeuse TPT HB-16 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotTPTHB-16
View MOS wet bench (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauMinaservicemina-acidPP
View MOSNano wet bench (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauPTS-DVTECHsorbonne
View Motion Capture system in G. BauzilRobots humanoïdesOlivier STASSEGuilhem SaurelQualisysMiqus M3
View Nano-imprint equipment NoMos (N- NEX)Nano imprintJean-Baptiste DoucetEmmanuelle DaranNanonexNX2500
View Nettoyage wafers UH-117 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotUltron Systems, Inc.UH-117
View Nitrogen atmosphere ovenIntegration/ Device mountingAdrian Laborde Verder / Carbolite HTMA4028-230SN
View Olympus MX50 (F-FRAI)Caractérisation / characterizationAurélie LECESTRElaurent bouscayrolOlympusMX50
View optical microscope NIKON NoMOS(F-FRAI)Caractérisation / characterizationJean-Baptiste DoucetJustine BonneauNIKONto be checked
View oscilloscope (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel CharlotTektronixTDS-2012
View Oven polymers NoMOS (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMemmertXXXX
View Paillasse Chime EJM - Solvants - III/V (F-FRAI)Epitaxie / Epitaxyquentin gravelierAlexandre ArnoultLAASPaillasse PVC LAAS
View Paillasse Chime EJM- Acides - III/V (F-FRAI)Epitaxie / Epitaxyquentin gravelierAlexandre ArnoultLAASPaillasse PVC LAAS
View Paillasse Chime EJM-1 (F-FRAI)Epitaxie / Epitaxyquentin gravelierAlexandre ArnoultLAASPaillasse PVC LAAS
View Paillasse de Développement & Stripping (F-FRAI)Procédés humides / Wet process benchesDavid BourrierJustine BonneauLAASDeveloppement
View Paillasse de Développement & Ultrason (F-FRAI)Procédés humides / Wet process benchesDavid BourrierJustine BonneauMinaservicesUltrasons
View Paillasse dépôts Alternatifs (E-MANU)Electrochimie/electroplatingDavid BourrierJustine BonneauLAASn°1
View paillasse electroless NOMOS (E-MANU)Procédés humides / Wet process benchesVéronique Conédérafabien mesnilgrenteCoillardpaillasse pvc
View paillasse jet d'encre NOMOS (F-FRAI)Procédés humides / Wet process benchesfabien mesnilgrenteVéronique ConédéraCoillardpaillasse pvc
View Parylene C30S (D-PARY)PVDGuillaume LibaudeAdrian LabordeComelecC30S
View PECS (D-PRST)PVDBenjamin ReigFranck CarcenacGATANPECS
View PECVD 100 ApSy MOS COMPATIBLE (T- CVD)PECVDPascal DubreuilJean Christophe MarrotApSyMultiplex CVD
View PHOTONIC PROFESSIONAL NoMOS (L- 3D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinNANOSCRIBEPHOTONIC PROFESSIONAL
View plaque chauffante 300°Cx (A-INTE)Integration/ Device mountingSamuel CharlotDavid BourrierSawatecHP-401-Z
View Plassys nano (D-PRST) MOSPVDLudovic SalvagnacGuillaume LibaudePlassysNano
View Plassys Organiques (D-OLED) NoMOSPVDLudovic SalvagnacGuillaume LibaudePlassysMEB550B
View Polarographie (E-CARA)Electrochimie/electroplatingDavid BourrierJustine BonneauMetrhom797 VA Computrace
View polisseuse ESCIL (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotEscil ESC200
View Polisseuse PM5 MOS (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechPM5
View Portes automatiques salle blancheSupport salle blancheEmmanuelle DaranLaurent MazenqPortalpxx
View Profilomètre mécanique Tencor P16+ (F-FRAI)Caractérisation / characterizationBenjamin ReigMairame DialloKLA TencorTencor P16+
View Profilomètre mécanique Tencor P17 (F-FRAI)Caractérisation / characterizationBenjamin ReigMairame DialloKLA TencorTencor P17
View Profilomètre optique LEXT (F-FRAI)Caractérisation / characterizationBenjamin Reigfabien mesnilgrenteOlympusOLS LEXT 3100
View Profilomètre optique SNEOX (F-FRAI)Caractérisation / characterizationBenjamin ReigMairame DialloSensoFarSNEOX
View Profilomètre optique Wyko (F-FRAI)Caractérisation / characterizationBenjamin Reig VEECOWYKO 3300
View Pull shear testeur MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotXyzteccondor sygma
View PyreneRobots humanoïdesOlivier STASSEGuilhem SaurelPAL-RoboticsTALOS
View RAITH150 NoMos (N-RAIT)Lithographie électronique / Ebeam lithographyFranck CarcenacAurélie LECESTRERAITHRAITH150 Version1
View RCA/Piranha cleaning MOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauVACOto be checked
View Recuit Au et Cu sur Si (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotASMFour horizontal LB 35
View Recuit Au et Cu sur tout substrats (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotASMFour horizontal LB 35
View Recuit ferrite 6" (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT/HT
View Recuit métaux divers sauf Au et Cu sur Si (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotASMFour horizontal LB 35
View Recuit métaux lourds 6" (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT
View Recuit Polyimide (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT
View Recuit verre 6" (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT/HT
View Rena Cuivre 4 pouces (E-AUTO)Electrochimie/electroplatingDavid BourrierJustine BonneauRENAEPM 100 F
View Rena Nickel 4 pouces (E-AUTO)Electrochimie/electroplatingDavid BourrierJustine BonneauRENAEPM 100 F
View Rena Or 4 pouces (E-AUTO)Electrochimie/electroplatingDavid BourrierJustine BonneauRENAEPM 100 F
View Report eutectique KnS 6482 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa6482
View Report flip chip MOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotSETFC150
View Report/Collage Tresky T3000 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotDr TreskyT3000
View Report/Collage Tresky T4907 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotDr TreskyT4907
View réseau air secSupport salle blancheLudovic SalvagnacBenjamin ReigSOME IndustrieCompair LRS22 10 bars
View Résistivimètre automatique (F-FRAI)Caractérisation / characterizationBenjamin ReigEric ImbernonChangmin TechCMT-SR200
View Résistivimètre manuel (F-FRAI)Caractérisation / characterizationBenjamin ReigEric Imbernon------
View Riber degas (D-PRST) NoMOSPVDLudovic SalvagnacGuillaume LibaudeRiberDegas
View right organic solvents fume hood with lowerable window NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauFluidairto be checked
View RomeoRobots humanoïdesOlivier STASSE Softbank roboticsRomeo 3
View RTP As-Master MOS Compatible (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAnnealsysAS-Master-2000HT
View RTP As-One (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAnnealsysAS-ONE
View Scie diamanté DAD-321 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotDISCODAD-321
View Scriber JFP-S100 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotOlivier Gauthier-LafayeCEFORIJFP-S100
View Scriber Karl-SUSS RH-100 MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKarl-SUSSRH-100
View Scriber SET MOS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotSETA3
View Scrubber éffluents gaz foursSupport salle blancheEric Imbernonlaurent bouscayrolCentrothermCT-BW
View semitool Spin Rinse Dryer Main Chem NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauSemitoolPSC-101
View sérigraphie MOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotDEK01i
View SFD NOMOS (J-TRAI)Traitement de surface / Surface treatmentfabien mesnilgrente 31 degreesSFD 200
View Shipley 3024 MOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotShipley3024
View Shipley 360 MOS (A-INTE)Integration/ Device mountingSamuel Charlot Shipley360
View SI200 MOS (G- ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolSENTECHEtchlab 200
View SI500-Chlorée MOS (G- ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolSENTECHSI500
View SI500-Fluorée NoMOS (G-DRIE)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolSENTECHSI500-DRIE
View Sonication cabin NoMOS (F-FRAI)Other processesJean-Baptiste DoucetJustine BonneauDVTECHAutotune
View Sorbonne dépôt électrolytiques Electrochimie/electroplatingDavid BourrierJustine BonneauPTSYamamoto 4-6 pouces
View SPD NOMOS (J-TRAI)Traitement de surface / Surface treatmentfabien mesnilgrente MEMSSTARSPD
View spectroline 248nm NOMOS (F-FRAI)Traitement de surface / Surface treatmentVéronique Conédérafabien mesnilgrentespectrolinePC-2200A
View Spectromètre UV-VIS (C-SPEC)Caractérisation / characterizationBenjamin Reig PerkinElmerlambda650
View SprayCoater Suss Microtec NoMOS (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecAltaspray
View station de neutralisation des effluents liquidesSupport salle blancheJean-Baptiste DoucetDavid BourrierVeoliaCustom
View Stepper I Line Canon MOS and NoMOS (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeCanonFPA 3000i4/i5
View Système de traitement d'airSupport salle blancheHugues Granier DiversDievrs
View Tankers azote liquideSupport salle blanchequentin gravelierHugues GranierLinde20 000 l et 50 000 l
View TEPLA plasma O2 NoMOS (F-FRAI)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolTEPLA300 semi-auto
View TERGEO NoMOS (F-FRAI)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolPIE SCIENTIFICTERGEO Plus Plasma Cleaner
View Test Tool 2Support salle blancheMartin (Admin) Klarqvist Intiro Development ABOne tool to rule them all
View Test Tool 3Support salle blancheMartin (Admin) Klarqvist Intiro Development ABOne tool to rule them all 2
View Test tool wrongSupport salle blancheHugues Granier TestbolagetA
View Testeur sous pointes (F-FRAI)Caractérisation / characterizationBenjamin ReigEric ImbernonSETTR5230
View TFE 644 Pulvérisation (D-PRST) NoMOSPVDLudovic SalvagnacGuillaume LibaudeThin FIlm Equipment (TFE)644
View ThermoGravimetric Analysis TGA (C- DSC)Caractérisation / characterizationBenjamin Reigfabien mesnilgrenteMettler-ToledoTGA-02
View Titration (E-CARA)Electrochimie/electroplatingDavid BourrierJustine BonneauMetrhomTitrando
View Tousimis NOMOS (J-TRAI)Traitement de surface / Surface treatmentfabien mesnilgrenteVéronique ConédéraTousimis915B
View Univex 450 Pulvérisation (D-PRST) NoMOSPVDLudovic SalvagnacGuillaume LibaudeOerlikonUnivex 450C
View UV Ozone NOMOS (F-FRAI)Traitement de surface / Surface treatmentfabien mesnilgrenteVéronique ConédéraJelight42
View UV -ozone NoMOS(F-FRAI)Traitement de surface / Surface treatmentJean-Baptiste DoucetJustine BonneauJelight42-220
View Vacuo-temp NOMOS (F-FRAI)Traitement de surface / Surface treatmentfabien mesnilgrenteVéronique ConédéraJ.P. SELECTAVacuo-temp
View Wafer bonder AML MOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotAMLWB4
View Wafer bonder SUSS NOMOS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotSUSSSB6e
View Wafer Substrate Bonding MOS (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechWSB1
View Varian Evaporation (D-PRST) NoMOSPVDLudovic SalvagnacGuillaume LibaudeMTB SolutionsVarian 3616
View wet batch photoresist stripping by AZ100 remover NoMOS(F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauVACOto be checked
View Wet Bench / Photo 1 NoMOS resist development (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMinaserviceNC
View Wet Bench / Photo 1 NoMOS resist spinner (F-FRAI)Photolithographie / PhotolithographyMairame DialloAdrian LabordeSuss MicrotecLabSpin6 BM
View Wet Bench / Photo 2 NoMOS resist development (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMinaserviceNC
View Wet Bench / Photo 2 NoMOS resist spinner (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecRC8
View Wet Bench / Photo 3 MOS resist development (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMinaserviceNC
View Wet Bench / Photo 3 MOS resist spinner (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecRC8
View wet bench III-V NoMOS(F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauCoillardto be checked
View wet bench metal etching NoMOS(F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauVACOwet bench
View wet bench organic solvents PDMS and outgasing NoMOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetJustine BonneauPTSHotte
View viscosimètre (F-FRAI)Integration/ Device mountingSamuel CharlotSamuel CharlotFungilabsmart
View viscosimètre NOMOS (F-FRAI)Caractérisation / characterizationfabien mesnilgrenteVéronique Conédéraanton paarAMVn
View Yamamoto 4'' (E-MANU)Electrochimie/electroplatingDavid BourrierJustine BonneauYamamotoSmart Cell 4 ''
View Yamamoto Cuivre 4/6" (E-MANU)Electrochimie/electroplatingDavid BourrierJustine BonneauLAASPlating Set 4'' and 6 ''
View Yamamoto Nickel 4/6" (E-MANU)Electrochimie/electroplatingDavid BourrierJustine BonneauYamamotoPlating Set 4'' and 6 ''
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