Picture of Tousimis NOMOS (J-TRAI)
Current status:
AVAILABLE
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Responsibles
1st Responsible:
fabien mesnilgrente
2nd Responsible:
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Description

Sécheur CO2 supercritique par contournement du point critique (31°C et 73 bar).

Compatible petits échantillons et jusqu'à 5 substrats de 150mm.

Pour le séchage de structures fragiles tels les MEMS suspendus ou microfabrication 3D (nanoscribe) par exemple.

English

Supercritical CO2 dryer by circumvention of the critical point (31°C et 73 bar).

Small substrate compatible and up to 5 6" wafers.

For drying of fragile structure as suspended MEMS or 3D microfabrication (nanoscribe) for exemple.

Details
Tool name:
Tousimis NOMOS (J-TRAI)
Area/room:
PVD (Bât F)
Category:
Traitement de surface / Surface treatment
Manufacturer:
Tousimis
Model:
915B
Validated processes informations

Substrat recouvert de solvant, purge du solvant au CO2 liquide à 10°C réglable de 1 à 60 minutes, contournement du point critique par montée en température vannes fermées.

Solvants utilisables : alcools et acétone.

English

Subtrate dipped in solvant, solvant purge with liquid CO2 (10°C) set from 1 to 60 minutes, critical point circumvention by temperature rising with closed valves.

Alcohol and actone compatibility.

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Instructors

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Tool Modes
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