Picture of ALD TFS200 NoMOS (T-CVD)
Current status:
DOWN
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Responsibles
1st Responsible:
Pascal Dubreuil
2nd Responsible:
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Description

ALD deposition equipment on all materials.

Deposit of Al2O3 up to 300°C

At longer : (TiO2, TiN) up to 300°C.

Details
Tool name:
ALD TFS200 NoMOS (T-CVD)
Area/room:
Photolithographies (Bât F)
Category:
ALD
Manufacturer:
BENEQ
Model:
TFS-200-232
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