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Wet Bench / Photo 1 NoMOS resist development (F-FRAI) (P17)

Current status:

AVAILABLE

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Responsibles

1st Responsible:

Adrian Laborde

2nd Responsible:

Files

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Description

Collective spin - rinse dryer.

Details

Tool name:

Wet Bench / Photo 1 NoMOS resist development (F-FRAI)

Area/room:

Photolithographies (Bât F)

Category:

Photolithographie / Photolithography

Manufacturer:

Minaservice

Model:

Tool Modes

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