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Wet Bench / Photo 1 NoMOS resist development (F-FRAI) (P17)
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Adrian Laborde
2nd Responsible:
Gwénaëlle Guittier
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Description
Collective spin - rinse dryer.
Details
Tool name:
Wet Bench / Photo 1 NoMOS resist development (F-FRAI)
Area/room:
Photolithographies (Bât F)
Category:
Photolithographie / Photolithography
Manufacturer:
Minaservice
Model:
NC
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