Picture of Wet Bench / Photo 2 NoMOS resist spinner (F-FRAI)
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Adrian Laborde
2nd Responsible:
Gwénaëlle Guittier
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Description

Manual coating and development workstation.

Allow manual coating, bake and development of photoresist on samples, 4" and 6" wafers.

Specifications:

- 1 coating station (Obducat QSC200BM with RCCT cover  for samples 3mm to to 150 mm wafers)

- 1 development station (puddle)

- 1 SU8 programmable hotplate (Suss Microtec)

- 2 hotplates

 

Postes de travail de photolithographie

Specifications:

- 1 tournette (Obducat pour substrats 3mm à 150mm)

- 1 plaque chauffante SU8 (Suss Microtec)

- 1 station de développement manuel (bécher)

 - 2 plaques chauffantes

Details
Tool name:
Wet Bench / Photo 2 NoMOS resist spinner (F-FRAI)
Area/room:
Photolithographies (Bât F)
Category:
Photolithographie / Photolithography
Manufacturer:
Suss Microtec
Model:
RC8
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Instructors

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Tool Modes
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