Picture of Four SIPOLY6 MOS COMPATIBLE (T- CVD)
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Four de dépôt LPCVD de silicium polycristallin 4 et 6".


4 and 6 inches LPCVD furnace for polysilicon deposition

Tool name:
Four SIPOLY6 MOS COMPATIBLE (T- CVD)
Area/room:
Traitements thermiques/thermal treament (Bâts F et
Category:
LPCVD
Manufacturer:
Centrotherm
Model:
Centronic E1550HT

Dépôt de Si-poly à partir de silane (SiH4) à 605°C. Epaisseur de 100 nm à 1 µm.


Si-poly deposition from SiH4 at 605°C. Thickness between 100 nm and 1 µm.

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