Spécifications:
Wafer size Up to 200 mm Square
substrate size Up to 200 x 200 mm
Bond alignment Standard Direct pre-bonding
Optional pre-bonding toolkit Plasma activation
Optional SELECT toolkit Mask alignment Optional mask aligner toolkit
Process Technologies Top-side, bottom-side, Optional: infrared alignment
Alignment accuracy Top-side alignment: 1 μm Bottom-side alignment:1 μm
Travel range X ±3 mm
Travel range Y ±3 mm
Travel range Theta ±3°
Process technologies Fusion pre-bonding, plasma activation
Operating system Windows 7 Programs Unlimited number of recipes
Operation Remote access possible
Vacuum < 0.8 bar
Compressed Air 8 bar (116 psi)
Nitrogen 3 bar