Wet bench used for the etching of metals such as gold, chromium, aluminium, platinum, copper, nickel,...and metal based oxydes such as AZO or ITO. The etching is done manually by pouring the suited wet etch solution in a dish and dipping the metalized wafer in the solution until the desired metalic layer is removed. The wafer is then pre-rinsed in a second dish of DI water and then rinsed in a rinse bath. After rinsing, the wafer is dried with a nitrogen gun or spinned dry. Beware of corrosive chemicals on the bench before use.Make sure there is no residues before starting to work.In case of suspect liquid on the bench rinse with DI water and dry prior to use. Always remove  chemicals  residues by rinsing and drying after use. Decontaminate by rinsing and drying glassware after use and place it's usual place. D'ont leave anything on the bench unless you have to and it is for a short period. In this case fill out a label to provide all the required informations about what you leave.