Picture of Hotplate automated n°2 NoMOS (F-FRAI)
Current status:
AVAILABLE
Book | Log| 
Show/Collapse all

Responsibles
1st Responsible:
Adrian Laborde
2nd Responsible:
Gwénaëlle Guittier
Files
You must be logged in to view files.
Description

Suss Microtec  baking system used at LAAS-CNRS since 2024.

Plaque chauffante Suss Microtec utilisée au LAAS-cnrs depuis 202

4

Details
Tool name:
Hotplate automated n°2 NoMOS (F-FRAI)
Area/room:
Photolithographies (Bât F)
Category:
Photolithographie / Photolithography
Manufacturer:
Suss Microtec
Model:
HP8
Validated processes informations

Temperature up to 150°C

Ramping speed : 5°C/min warming up, 2°C/min cooling down

-----------------------------------------------

Temperature max de 150°C

Vitesse des rampes : 5°C/min en montée, 2°C/min en descente

Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
You must be logged in to view tool modes.