Picture of Hotplate automated n°2 NoMOS (F-FRAI)
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AVAILABLE
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Suss Microtec  baking system used at LAAS-CNRS since 2024.

Plaque chauffante Suss Microtec utilisée au LAAS-cnrs depuis 202

4

Tool name:
Hotplate automated n°2 NoMOS (F-FRAI)
Area/room:
Photolithographies (Bât F)
Category:
Photolithographie / Photolithography
Manufacturer:
Suss Microtec
Model:
HP8

Temperature up to 150°C

Ramping speed : 5°C/min warming up, 2°C/min cooling down

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Temperature max de 150°C

Vitesse des rampes : 5°C/min en montée, 2°C/min en descente

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