Wet bench for nanoMOS technology.

This wet bench is designed to handle Metallic contaminations sensitive nanosamples i.e. nanoMOS technology.  MOS technology detrimental metals like gold or copper are not allowed in this wet bench, neither are sodium or potassium salts. Particles generating processes such as lift off are not allowed to.

The bench can be used etiher with organic solvents or acids but not at the same time, especially when dealing with strongly incompatible chemicals such as H₂O₂/H₂SO₄ mixture and acetone