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 NameCategory1st responsible2nd responsibleManufacturerModel
View Batch Buffer Oxide Etching 1-7 MOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetTom Gouveiato be precisedto be checked
View left organic solvents fume hood with lowerable window (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet Fluidairto be checked
View wet bench for harmless chemistry (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet Coillardto be checked
View AAS (E-CARA)Electrochimie/electroplatingDavid Bourrier Perkin ElmerAAnalyst 400 AA
View AC450CT Pulvérisation (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudeAlliance ConceptAC450CT
View acid wet bench for multicleaning and etching(F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet PTS092018-001
View AFM DIMENSION (C-AFM)Caractérisation / characterizationBenjamin ReigEmmanuelle DaranVEECODimension 3100
View AFM ICON (C-AFM)Caractérisation / characterizationBenjamin ReigEmmanuelle DaranBRUKERDimension ICON
View ALCATEL P1 (G-DRIE)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolALCATEL-ADIXENAMS4200-P1
View ALCATEL P4 (G-DRIE)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolAlcatel - AdixenAMS4200
View ALD MOS (T-CVD)ALDPascal Dubreuilscheid emmanuelCambridge NanotechFiji F200
View ALD-NOMOS (T-CVD)ALDPascal Dubreuilscheid emmanuelSentechSi-ALD-LL ALD024
View Aligneur Suss (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotSUSSBA8
View Altadrop (J-JET)Jet d'encre / ink jetfabien mesnilgrenteVéronique ConédéraAltatechAltadrop
View ApSy E100 (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudeApplication SystemesE100
View Aspiration centraliséeSupport salle blancheAntoine Maiorano axpirtech aldesaxpirtechh FH34-2
View Auroless (E-MANU)Electrochimie/electroplatingDavid Bourrier Minaservices4"
View balance (F-FRAI)Caractérisation / characterizationfabien mesnilgrenteVéronique ConédéraMettlerAE100
View Boucle de refroidissementSupport salle blancheAntoine Maiorano SPIEXXX
View carotteuse ultra sonique (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel Charlotfishione170
View Centrale Eau DISupport salle blancheAntoine Maiorano C2RLAAS 2005
View Ceradrop (J-JET)Jet d'encre / ink jetfabien mesnilgrenteVéronique ConédéraCeradropF-Series
View clean wet bench organic solvents (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetTom GouveiaDV TechHotte
View Cvs (E-CARA)Electrochimie/electroplatingDavid Bourrier MetrhomCvs
View D8-Discover (M-DRX)Epitaxie / EpitaxyAlexandre Arnoultquentin gravelierBruker AXSD8-Discover (Da Vinci)
View Découpe Graphtec (A-MONT)Assemblage / Device mountingSamuel CharlotGuy ARDITGraphtecFC8600
View DIENER plasma O2 (F-FRAI)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolDIENERNano
View Differential Scanning Calorimetry (C-DSC)Caractérisation / characterizationBenjamin Reig NETZSCHDSC 404 F3 Pegasus
View Digidrop (F-FRAI)Caractérisation / characterizationBenjamin Reigfabien mesnilgrenteGBX InstrumentDigidrop
View DILASE 3D HR (L-3D)Lithographie laser / Laser lithographyPierre-François CalmonRémi CoursonKLOEDilase 3D
View DILASE 3D MR (L-3D)Lithographie laser / Laser lithographyPierre-François CalmonRémi CoursonKLOEDilase 3DMR
View DILASE 650 (L-2D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinKLOEDILASE 650
View DILASE 750 (L-2D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinKLOEDILASE 750
View DWL 200 (L-DWL)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinHEIDELBERG INSTRUMENTSDWL 200
View Ellipsomètre HJY (C-SPEC)Caractérisation / characterizationBenjamin ReigEric ImbernonHoriba Jobin YvonUvisel
View encolleuse (A-MONT)Integration/ Device mountingSamuel CharlotSamuel CharlotJanomeGLT JR2400N
View Etchlab 200 (G-ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolSENTECHEtchlab 200
View étuve HMDS auto (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeYesYes
View étuve HMDS manuel (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeYesYes
View Etuve Horo (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotHORO250
View étuve MEMMERT (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotMemmertUFB400
View étuve polymères (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMemmertXXXX
View Etuve TETHYS (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotTETHYSFisher-Band
View étuve Thermox (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel CharlotThermo scientificVacutherm
View Etuve vieillissement thermique (A-MONT)Integration/ Device mountingSamuel CharlotSamuel CharlotSecasiBC21
View EVA 600 Evaporation (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudeAlliance ConceptEVA 600
View EVG120 (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqLaurent MazenqEVG120
View EVG620 (P-PHOT)Photolithographie / PhotolithographyAdrian LabordeLaurent MazenqEVG620
View Fer à souder Weller (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel CharlotWellerWSD81
View FIB Dual Beam (C-FIB)Caractérisation / characterizationBenjamin ReigFranck CarcenacFEIHelios 600i
View Film monter UH-115 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotUltron Systems, Inc.UH-115
View Form 3 (L-3D)Assemblage / Device mountingSamuel CharlotRémi CoursonFormlabsForm 3
View Four AET Bore (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotAETFour d'oxydation
View Four AET Phosphorex (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotAETFour d'oxydation
View Four AET Propre (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotAETFour d'oxydation
View Four AET Reve (T-CVD)LPCVDscheid emmanuelEric ImbernonAETSEP - 28486
View Four Alox (T-FOUR)Oxydation Guilhem Almuneau AETFour d'oxydation
View Four de refusion (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotMadellTYR108C
View Four DIFPHOS6 (T-FOUR)redistribution, diffusionEric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four OXYBORE6 (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four OXYNIT6 (T-CVD)LPCVDEric ImbernonPascal DubreuilCentrothermCentronic E1550HT
View Four OXYPHOS6 (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four OXYPROP6 (T-FOUR)Oxydation Eric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four RECUIT6 (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotCentrothermCentronic E1550HT
View Four SI3N46 (T-CVD)LPCVDEric ImbernonPascal DubreuilCentrothermCentronic E1550HT
View Four SIPOLY6 (T-CVD)LPCVDEric ImbernonPascal DubreuilCentrothermCentronic E1550HT
View Four Tempress Si-poly (T-CVD)LPCVDEric ImbernonPascal DubreuilTempressDépot LPCVD
View FOURNITURE ( Fourn)Support salle blancheHugues GranierMonique DilhanLAASFourniture
View FTIR (C-SPEC)Caractérisation / characterizationBenjamin ReigJean-Baptiste DoucetBRUKERTENSOR 27
View fume hood exploratory chemistry (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet to be precisedto be checked
View GenISys lab (LOGI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeGenISys Lab v4.7.0
View Glove box for HF based chemistry (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet DVTECHto be checked
View Gravure KOH (E-ANIS)Procédés humides / Wet process benchesDavid Bourrier MinaservicesKOH
View Gravure TMAH (E-ANIS)Procédés humides / Wet process benchesDavid Bourrier MinaservicesTMAH
View Grinder G&N (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotGrinderMPS2 R300 D CS
View HMDS Obducat (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeObducat Solar Semi QS V 200 BM 200°C
View HMP 90 (L-DWL)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinSUSSHMP 90
View Hotte implanteur (F-FRAI)ImplantationEric ImbernonJean Christophe MarrotMinaserviceHotte
View Hotte Litho laser (F-FRAI)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinDV TechPaillasse
View hotte montage (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel Charlotunknouwnunknouwn
View Hotte nano (F-FRAI)Nano imprintFranck CarcenacJean-Baptiste DoucetDVTEchHotte nano
View Hotte polissage (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel Charlotunknouwnunknouwn
View hotte solvants (F-FRAI)Integration/ Device mountingSamuel CharlotSamuel CharlotMina servicesinox
View Hotte Wafer Bonder (F-FRAI)Integration/ Device mountingSamuel CharlotSamuel CharlotDevetekno model
View HRP2-N14Robots humanoïdesOlivier STASSE KawadaHRP2
View ICP2 III-V et NoMos (G-ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolTrikon (SPTS)Omega 201 (1996)
View ICP3 NoMos (G-ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolTrikon (SPTS)Omega 201 (1994)
View ICPECVD (T-CVD)PECVDJean Christophe MarrotPascal DubreuilOxfordPlasmalab 100 - HDPECVD
View Implanteur ionique IMC 200 (I-IMPL)ImplantationEric ImbernonJean Christophe MarrotEatonNV 4206
View Jauge de mesure d'épaisseur (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechSYLVAC CH-1023 Crissier
View MA6 Gen4 (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecMABA6Gen4
View MBE2300 (M-EJM)Epitaxie / EpitaxyAlexandre Arnoultquentin gravelierRIBER SAMBE2300
View MBE32P (M-EJM)Epitaxie / EpitaxyAlexandre Arnoultquentin gravelierRIBER SAMBE32P
View MBE412 (M-EJM)Epitaxie / EpitaxyAlexandre Arnoultquentin gravelierRIBER SAMBE412
View MEB S-3700N (C-MEB)Caractérisation / characterizationBenjamin ReigFranck CarcenacHITACHIS-3700N
View MEB S-4800 (C-MEB)Caractérisation / characterizationBenjamin ReigFranck CarcenacHITACHIS-4800
View Mesure planéité (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechGI20
View Micro Injecteur (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotNarishigeIM 300
View microscope Leica (F-FRAI)Integration/ Device mountingSamuel CharlotSamuel CharlotLeicaEZ4D
View microscope leica photo auto (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeLeicaDM4000M
View microscope leica photo manuel (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeLeicaDM-4000M
View Microscope optique Leica (F-FRAI)Caractérisation / characterizationBenjamin ReigAvatar BenjaminLEICADM4000
View Micro-soudeuse Delvotec 5430 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotDelvotec5430
View Micro-soudeuse KnS 4526 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa4526
View Micro-soudeuse KnS 4700 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa4700
View Micro-soudeuse KnS 484 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa484
View Micro-soudeuse KnS 484x (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa484
View Micro-soudeuse TPT HB-16 5 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotTPTHB-16
View MOS wet bench (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet Minaservicemina-acidPP
View Nano-imprint equipment (N-NEX)Nano imprintJean-Baptiste DoucetEmmanuelle DaranNanonexNX2500
View NanoMOS wet bench (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet PTS-DVTECHsorbonne
View Nettoyage wafers UH-117 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotUltron Systems, Inc.UH-117
View Olympus MX50 (F-FRAI)Caractérisation / characterizationAurélie LECESTRElaurent bouscayrolOlympusMX50
View optical microscope NIKON (F-FRAI)Caractérisation / characterizationJean-Baptiste DoucetTom GouveiaNIKONto be checked
View oscilloscope (F-FRAI)Assemblage / Device mountingSamuel CharlotSamuel CharlotTektronixTDS-2012
View Paillasse Chime EJM - Solvants - III/V (F-FRAI)Epitaxie / Epitaxyquentin gravelierAlexandre ArnoultLAASPaillasse PVC LAAS
View Paillasse Chime EJM- Acides - III/V (F-FRAI)Epitaxie / Epitaxyquentin gravelierAlexandre ArnoultLAASPaillasse PVC LAAS
View Paillasse Chime EJM-1 (F-FRAI)Epitaxie / Epitaxyquentin gravelierAlexandre ArnoultLAASPaillasse PVC LAAS
View Paillasse de Développement & Stripping (F-FRAI)Procédés humides / Wet process benchesDavid Bourrier LAASDeveloppement
View Paillasse de Développement & Ultrason (F-FRAI)Procédés humides / Wet process benchesDavid Bourrier MinaservicesUltrasons
View Paillasse dépôts Alternatifs (E-MANU)Electrochimie/electroplatingDavid Bourrier LAASn°1
View paillasse electroless (E-MANU)Procédés humides / Wet process benchesVéronique Conédérafabien mesnilgrenteCoillardpaillasse pvc
View paillasse jet d'encre (F-FRAI)Procédés humides / Wet process benchesfabien mesnilgrenteVéronique ConédéraCoillardpaillasse pvc
View paillasse photo 1 : poste de développement (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMinaserviceNC
View paillasse photo 1 : tournette 1 (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecLabSpin6 BM
View paillasse photo 2 :procédés spécifiques (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMinaserviceNC
View paillasse photo 2 :procédés spécifiques (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecRC8
View paillasse photo 3 :procédés MOS (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeMinaserviceNC
View paillasse photo 3 :procédés MOS (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecRC8
View Parylene C30S (D-PARY)PVDGuillaume LibaudeAdrian LabordeComelecC30S
View PECS (D-PREC/STA)PVDBenjamin ReigFranck CarcenacGATANPECS
View PECVD 100 ApSy (T-CVD)PECVDPascal DubreuilJean Christophe MarrotApSyMultiplex CVD
View PHOTONIC PROFESSIONAL (L-3D)Lithographie laser / Laser lithographyPierre-François CalmonDavid ColinNANOSCRIBEPHOTONIC PROFESSIONAL
View plaque chauffante 300°Cx (A-INTE)Integration/ Device mountingSamuel CharlotDavid BourrierSawatecHP-401-Z
View plaque chauffante SU8 n°1 (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecHP
View plaque chauffante SU8 n°2x (F-FRAI)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecHP
View Plassys nano (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudePlassysNano
View Plassys Organiques (D-OLED)PVDLudovic SalvagnacGuillaume LibaudePlassysMEB550B
View Polarographie (E-CARA)Electrochimie/electroplatingDavid Bourrier Metrhom797 VA Computrace
View polisseuse CDP41 (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechCDP41
View polisseuse ESCIL (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotEscil ESC200
View Polisseuse PM5 (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechPM5
View Profilomètre mécanique Tencor P16+ (F-FRAI)Caractérisation / characterizationBenjamin Reigfabien mesnilgrenteKLA TencorTencor P16+
View Profilomètre mécanique Tencor P17 (F-FRAI)Caractérisation / characterizationBenjamin Reigfabien mesnilgrenteKLA TencorTencor P17
View Profilomètre optique LEXT (F-FRAI)Caractérisation / characterizationBenjamin Reigfabien mesnilgrenteOlympusOLS LEXT 3100
View Profilomètre optique Wyko (F-FRAI)Caractérisation / characterizationBenjamin Reig VEECOWYKO 3300
View Pull shear testeur (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotXyzteccondor sygma
View PyreneRobots humanoïdesOlivier STASSEGuilhem SaurelPAL-RoboticsTALOS
View RAITH150 (N-RAIT)Lithographie électronique / Ebeam lithographyFranck CarcenacAurélie LECESTRERAITHRAITH150 Version1
View RCA/Piranha cleaning MOS (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetTom GouveiaVACOto be checked
View Recuit Au et Cu sur Si (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotASMFour horizontal LB 35
View Recuit ferrite 6" (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT/HT
View Recuit métaux divers sauf Au et Cu sur Si (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotASMFour horizontal LB 35
View Recuit métaux lourds 6" (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT
View Recuit métaux sur substrats verre (T-FOUR)Recuits / AnnealingEric ImbernonJean Christophe MarrotASMFour horizontal LB 35
View Recuit Polyimide (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT
View Recuit verre 6" (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAETBati de recuit 2 tubes MT/HT
View Rena Cuivre 4 pouces (E-AUTO)Electrochimie/electroplatingDavid Bourrier RENAEPM 100 F
View Rena Nickel 4 pouces (E-AUTO)Electrochimie/electroplatingDavid Bourrier RENAEPM 100 F
View Rena Or 4 pouces (E-AUTO)Electrochimie/electroplatingDavid Bourrier RENAEPM 100 F
View Report Eutectique (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotSETsc910
View Report eutectique KnS 6482 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKulicke and Soffa6482
View Report flip chip (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotSETFC150
View Report/Collage Tresky T3000 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotDr TreskyT3000
View Report/Collage Tresky T4907 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotDr TreskyT4907
View réseau air secSupport salle blancheAntoine Maiorano SOME IndustrieCompair LRS22 10 bars
View Réseau éffluents gazSupport salle blancheEric Imbernon CentrothermCT-BW
View Résistivimètre automatique (F-FRAI)Caractérisation / characterizationBenjamin ReigEric ImbernonChangmin TechCMT-SR200
View Résistivimètre manuel (F-FRAI)Caractérisation / characterizationBenjamin ReigEric Imbernon------
View Riber degas (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudeRiberDegas
View right organic solvents fume hood with lowerable window (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetTom GouveiaFluidairto be checked
View RomeoRobots humanoïdesOlivier STASSE Softbank roboticsRomeo 3
View RTP As-Master (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAnnealsysAS-Master-2000HT
View RTP As-One (T-FOUR)Recuits / AnnealingJean Christophe MarrotEric ImbernonAnnealsysAS-ONE
View Scie diamanté DAD-321 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotDISCODAD-321
View Scriber JFP-S100 (A-MONT)Assemblage / Device mountingSamuel CharlotOlivier Gauthier-LafayeCEFORIJFP-S100
View Scriber Karl-SUSS RH-100 (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotKarl-SUSSRH-100
View Scriber SET (A-MONT)Assemblage / Device mountingSamuel CharlotSamuel CharlotSETA3
View semitool Spin Rinse Dryer Main Chem (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet SemitoolPSC-101
View sérigraphie (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotDEK01i
View SFD (J-TRAIT)Traitement de surface / Surface treatmentfabien mesnilgrente 31 degreesSFD 200
View Shipley 3024 (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotShipley3024
View Shipley 360 (A-INTE)Integration/ Device mountingSamuel Charlot Shipley360
View SI500 (G-ICP)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolSENTECHSI500
View SI500-DRIE (G-DRIE)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolSENTECHSI500-DRIE
View Sonication cabin (F-FRAI)Other processesJean-Baptiste Doucet plasturgisteAutotune
View SPD (J-TRAIT)Traitement de surface / Surface treatmentfabien mesnilgrente MEMSSTARSPD
View spectroline 248nm (F-FRAI)Traitement de surface / Surface treatmentVéronique Conédérafabien mesnilgrentespectrolinePC-2200A
View Spectromètre UV-VIS (C-SPEC)Caractérisation / characterizationBenjamin Reig PerkinElmerlambda650
View Stepper Canon (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeCanonFPA 3000i4/i5
View Suss MA150 (P-PHOT)Photolithographie / PhotolithographyAdrian LabordeLaurent MazenqSuss Microtec150 CC
View Suss MA6 (P-PHOT)Photolithographie / PhotolithographyAdrian LabordeLaurent MazenqSuss Microtec6
View Suss MJB3 GaAs (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecMJB3
View Suss MJB3 Si (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecMJB3
View Suss SprayCoater (P-PHOT)Photolithographie / PhotolithographyLaurent MazenqAdrian LabordeSuss MicrotecAltaspray
View TEPLA plasma O2 (F-FRAI)Gravure plasma / Plasma etchingAurélie LECESTRElaurent bouscayrolTEPLA300 semi-auto
View Test toolSupport salle blancheHugues Granier TestbolagetA
View Test Tool 2Support salle blancheMartin (Admin) Klarqvist Intiro Development ABOne tool to rule them all
View Test Tool 3Support salle blancheMartin (Admin) Klarqvist Intiro Development ABOne tool to rule them all 2
View Testeur sous pointes (F-FRAI)Caractérisation / characterizationBenjamin ReigEric ImbernonSETTR5230
View TFE 644 Pulvérisation (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudeThin FIlm Equipment (TFE)644
View Titration (E-CARA)Electrochimie/electroplatingDavid Bourrier MetrhomTitrando
View Tousimis (J-TRAIT)Traitement de surface / Surface treatmentfabien mesnilgrenteVéronique ConédéraTousimis915B
View Univex 450 Pulvérisation (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudeOerlikonUnivex 450C
View UV -ozone (F-FRAI)Traitement de surface / Surface treatmentJean-Baptiste DoucetTom GouveiaJelight42-220
View UV Ozone (F-FRAI)Traitement de surface / Surface treatmentfabien mesnilgrenteVéronique ConédéraJelight42
View Wafer bonder AML (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotAMLWB4
View Wafer bonder SUSS (A-INTE)Integration/ Device mountingSamuel CharlotSamuel CharlotSUSSSB6e
View Wafer Substrate Bonding (A-POLI)Assemblage / Device mountingSamuel CharlotSamuel CharlotLogitechWSB1
View WAFERS / SUBSTRATS (FOURN)Photolithographie / PhotolithographyAdrian LabordeLaurent MazenqTEAMSubstrats
View Varian Evaporation (D-PREC/STA)PVDLudovic SalvagnacGuillaume LibaudeMTB SolutionsVarian 3616
View wet batch photoresist stripping by AZ100 remover (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste Doucet VACOto be checked
View wet bench III-V (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetTom GouveiaCoillardto be checked
View wet bench metal etching (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetTom GouveiaVACOwet bench
View wet bench organic solvents PDMS and outgasing (F-FRAI)Procédés humides / Wet process benchesJean-Baptiste DoucetTom GouveiaPTSHotte
View viscosimètre (F-FRAI)Integration/ Device mountingSamuel CharlotSamuel CharlotFungilabsmart
View viscosimètre(F-FRAI)Caractérisation / characterizationfabien mesnilgrenteVéronique Conédéraanton paarAMVn
View Yamamoto 4'' (E-MANU)Electrochimie/electroplatingDavid Bourrier YamamotoSmart Cell 4 ''
View Yamamoto Cuivre 4/6" (E-MANU)Electrochimie/electroplatingDavid Bourrier LAASPlating Set 4'' and 6 ''
View Yamamoto Nickel 4/6" (E-MANU)Electrochimie/electroplatingDavid Bourrier YamamotoPlating Set 4'' and 6 ''
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