Picture of acid wet bench for multicleaning and etching
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AVAILABLE
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Wet bench for the cleaning of batches of up to 25 4 inch wafers by H2O2/H2SO4 mixture and/or 5% HF.  individual 6  inch wafer can be cleaned as well. Other chemistry are gradually being introduced like Si3Netching by phosporic acid, HF/ethanol or Buffered HF

Tool name:
acid wet bench for multicleaning and etching
Area/room:
Chimie / Chemistry (Bât F)
Category:
Procédés humides / Wet process benches
Manufacturer:
PTS
Model:
092018-001
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:

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