Picture of Four Tempress Si-poly (T-CVD)
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Four de dépôt LPCVD de Si-poly et Si-poly dopé Bore.


Si-poly and boron-doped Si-poly LPCVD depostion furnace.

Tool name:
Four Tempress Si-poly (T-CVD)
Area/room:
Traitements thermiques/thermal treament (Bâts F et
Category:
LPCVD
Manufacturer:
Tempress
Model:
Dépot LPCVD
Max booking time, day:
8 hours
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0 hours
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