Picture of Four Tempress Si-poly MOS COMPATIBLE (T- CVD)
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AVAILABLE
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Responsibles
1st Responsible:
Pascal Dubreuil
2nd Responsible:
Eric Imbernon
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Description

Four de dépôt LPCVD de Si-poly et Si-poly dopé Bore.

Si-poly and boron-doped Si-poly LPCVD depostion furnace.

Details
Tool name:
Four Tempress Si-poly MOS COMPATIBLE (T- CVD)
Area/room:
Traitements thermiques/thermal treament (Bâts F et
Category:
LPCVD
Manufacturer:
Tempress
Model:
Dépot LPCVD
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