Picture of Four SIPOLY6 (T-LPCV)
Current status:
DOWN
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

Four de dépôt LPCVD de silicium polycristallin 4 et 6".

4 and 6 inches LPCVD furnace for polysilicon deposition

Tool name:
Four SIPOLY6 (T-LPCV)
Area/room:
Traitements thermiques/thermal treament (Bâts F et
Category:
LPCVD
Manufacturer:
Centrotherm
Model:
Centronic E1550HT
Max booking time, day:
8 hours
Max booking time, night:
8 hours
No. of future bookings:

Dépôt de Si-poly à partir de silane (SiH4) à 605°C. Epaisseur de 100 nm à 1 µm.

Si-poly deposition from SiH4 at 605°C. Thickness between 100 nm and 1 µm.

Instructors

Licensed Users

You must be logged in to view tool modes.