This equipment is devoted to the removal of photoresist after it played a temporary role (as a mask for wet etching for instance). It is composed of 2 heated bath of AZ100 remover (they can be agitated by sonication) and 1 rising bath of DI water with resistivity checking. The first bath is used to remove most of the resist, and the second bath to wash away the residues. The DI water rising bath is used to eliminate the solvents.
If the level of AZ100 remover chemical is to low for you, you can adjust it by pouring some fresh AZ100 remover from the bottles in the equipment drawer.