Picture of wet batch photoresist stripping by  AZ100 remover
Current status:
WARNING
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This equipment is devoted to the removal of photoresist after it played a temporary role (as a mask for wet etching for instance). It is composed of 2 heated bath of AZ100 remover (they can be agitated by sonication) and 1 rising bath of DI water with resistivity checking. The first bath is used to remove most of the resist, and the second bath to wash away the residues. The DI water rising bath is used to eliminate the solvents.

 

Tool name:
wet batch photoresist stripping by AZ100 remover
Area/room:
Chimie / Chemistry (Bât F)
Category:
Procédés humides / Wet process benches
Manufacturer:
VACO
Model:
to be checked
Max booking time, day:
12 hours
Max booking time, night:
12 hours
No. of future bookings:

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