Picture of MOS wet bench (F-FRAI)
Current status:
AVAILABLE
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This wet bench is designed to handle Metallic contaminations sensitive sample i.e. MOS technology. It can be used either for nanomos or mocroscale MOS devices. MOS technology detrimental metals like gold or copper are not allowed in this wet bench, neither are sodium or potassium salts.

The bench can be used etiher with organic solvents or acids but not at the same time, especially when dealing with strongly incompatible chemicals such as H2O2/H2SO4 mixture and acetone

Tool name:
MOS wet bench (F-FRAI)
Area/room:
Lithographie laser : Laser Lithography (Bât G1)
Category:
Procédés humides / Wet process benches
Manufacturer:
Minaservice
Model:
mina-acidPP
Max booking time, day:
12 hours
Max booking time, night:
0 hours
No. of future bookings:
30

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