Semi Automated Resist Developpment Station : manual wafer handling by operator, automatic development with machine recipe.

Media available :

- MF-CD-26 Developer

- MIBK Developer

- SU-8 Developer

- IPA (rincing)

- DI Water (rincing)

- Nitrogen (drying)

Compatible wafer sizes :

- 2,3,4,5 and 6 inch (can handle wafers with high bow/warp or pierced holes)

- small sample (with dedicated bowl chuck)