Picture of RCA/Piranha cleaning MOS
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AVAILABLE
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Wet bench for the RCA or piranha cleaning of batches of up to 25 wafers of silicon ( 4 or 6 inch) . Includes a Spin Rinse Dryer. MOS technology, no metal or organics are allowed in this equipment.

Tool name:
RCA/Piranha cleaning MOS
Area/room:
Lithographie laser : Laser Lithography (Bât G1)
Category:
Procédés humides / Wet process benches
Manufacturer:
VACO
Model:
to be checked
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:

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