Picture of NanoMOS wet bench
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AVAILABLE
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Wet bench for nanoMOS technology.

This wet bench is designed to handle Metallic contaminations sensitive nanosamples i.e. nanoMOS technology.  MOS technology detrimental metals like gold or copper are not allowed in this wet bench, neither are sodium or potassium salts. Particles generating processes such as lift off are not allowed to.

The bench can be used etiher with organic solvents or acids but not at the same time, especially when dealing with strongly incompatible chemicals such as H2O2/H2SO4 mixture and acetone

Tool name:
NanoMOS wet bench
Area/room:
Photolithographies (Bât F)
Category:
Procédés humides / Wet process benches
Manufacturer:
PTS-DVTECH
Model:
sorbonne
Max booking time, day:
200 hours
Max booking time, night:
hours
No. of future bookings:

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