Manual coating and development workstation.

Allow manual coating, bake and development of photoresist on samples, 4" and 6" wafers.

Specifications:

- 1 coating station (Suss microtec Labspin for samples to 6'' wafers)

-1 HMDS surface treatment (obducat)

- 1 development station (puddle)

- 1 hotplate

Postes de travail de photolithographie

Specifications:

- 1 tournette (Suss microtec Labspin pour substrats 150mm)

- 1 système de traitement HMDS (obducat)

- 1 station de développement manuel (bécher)

 - 1 plaque chauffante