Picture of dilute or buffered HF etching including metalized wafers
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

This bench is devoted to native silicon oxide removal with 5% HF or silicon oxide etching with 1-7 BOE (Buffered Oxide Etchant) or other uses of HF based chemicals.Beware of toxic and corrosive chemicals on the bench before use.Make sure there is no residues before starting to work.In case of suspect liquid on the bench rinse with DI water and dry prior to use. Always remove  chemicals  residues by rinsing and drying after use. Empty and decontaminate by rinsing and drying plasticware after use and place it's usual place. Don't leave any chemical in the plasticware on the bench unless you have to and it is for a short period. In this case fill out a label to provide all the required informations about what you leave. 

Tool name:
dilute or buffered HF etching including metalized wafers
Area/room:
Chimie / Chemistry (Bât F)
Category:
Procédés humides / Wet process benches
Manufacturer:
VACO
Model:
to be checked
Max booking time, day:
12 hours
Max booking time, night:
12 hours
No. of future bookings:

Instructors

Licensed Users

You must be logged in to view tool modes.