Picture of Wet Bench / Photo 1 NoMOS resist development (F-FRAI)
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

Collective spin - rinse dryer.

Tool name:
Wet Bench / Photo 1 NoMOS resist development (F-FRAI)
Area/room:
Photolithographies (Bât F)
Category:
Photolithographie / Photolithography
Manufacturer:
Minaservice
Model:
NC
Max booking time, day:
4 hours
Max booking time, night:
0 hours
No. of future bookings:

Instructors

Licensed Users

You must be logged in to view tool modes.