Picture of Wet Bench / Photo 1 NoMOS resist development (F-FRAI)
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Collective spin - rinse dryer.

Tool name:
Wet Bench / Photo 1 NoMOS resist development (F-FRAI)
Area/room:
Photolithographies (Bât F)
Category:
Photolithographie / Photolithography
Manufacturer:
Minaservice
Model:
NC

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