Picture of semitool Spin Rinse Dryer Main Chem (F-FRAI)
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AVAILABLE
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Spin Rinse Dryer  for 4 inch wafers baskets up to 25 wafers.  This SRD will rinse and dry the wafers . Make sure the wafers have been rinse after the chemistry and before introducing them in the SRD.

Tool name:
semitool Spin Rinse Dryer Main Chem (F-FRAI)
Area/room:
Chimie / Chemistry (Bât F)
Category:
Procédés humides / Wet process benches
Manufacturer:
Semitool
Model:
PSC-101
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

1) Turn on nitrogen (2,4 bar)

2) turn on DI water

3) Turn on power

4) Load the  basket with the wafers inside

5) push on the start button and wait for the process to be completed ( up to about 20 minutes)

6) unload the wafers containing basket

7) turn power of

8) turn nitrogen of

9) turn DI water of

 

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