Picture of DWL 200  (L-DLW)
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AVAILABLE
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Système d’écriture laser pour la fabrication de masques optiques et l’écriture directe sur substrats

Direct writing laser for masks making and wafers

Tool name:
DWL 200 (L-DLW)
Area/room:
Lithographie laser : Laser Lithography (Bât G1)
Category:
Lithographie laser / Laser lithography
Manufacturer:
HEIDELBERG INSTRUMENTS
Model:
DWL 200
Max booking time, day:
48 hours
Max booking time, night:
48 hours
No. of future bookings:

Fabrication de masques de tailles 2.5, 4, 5 et 7 pouces avec chargeur automatique


Fabrication de réticules 6 pouces pour stepper CANON LAAS


Ecriture directe sur échantillons de tailles comprises entre 20 et 200 mm


Mesures de motifs de tailles comprises entre 10 µm et 200 mm
 

Fabricate masks sizes 2.5", 4", 5" and 7" with an automatic loader

Fabricate reticles 6" for stepper CANON LAAS

Direct writing on substrates 20 - 200 mm

Patterns measurements with sizes between 10 µm and 200 mm

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