Picture of Wet Bench / Photo 3 MOS resist spinner (F-FRAI)
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

Manual coating and development workstation.

Allow manual coating, bake and development of photoresist on samples, 4" and 6" wafers.

Specifications:

- 1 coating station (Suss microtec RC8 for samples to 6'' wafers)

- 1 development station (puddle)

- 1 SU8 programmable hotplate (Suss Microtec)

- 2 hotplates

 

Postes de travail de photolithographie

Specifications:

- 1 tournette (Suss Microtec RC8 pour substrats 10mm à 150mm)

- 1 plaque chauffante SU8 avec rampes en température

- 1 station de développement manuel (bécher)

 - 2 plaques chauffantes

Tool name:
Wet Bench / Photo 3 MOS resist spinner (F-FRAI)
Area/room:
Photolithographies (Bât F)
Category:
Photolithographie / Photolithography
Manufacturer:
Suss Microtec
Model:
RC8

Instructors

Licensed Users

You must be logged in to view tool modes.