Picture of Batch Buffer Oxide Etching 1-7 MOS (F-FRAI)
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Wet bench for the batch etching of silicon oxide with up to 25 6 or 4 inch wafers. MOS technology, no metals are allowed in this equipment.
 

Tool name:
Batch Buffer Oxide Etching 1-7 MOS (F-FRAI)
Area/room:
Chimie / Chemistry (Bât F)
Category:
Procédés humides / Wet process benches
Manufacturer:
cybernétix
Model:
F143 4257
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:

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