Manual coating and development workstation.
Allow manual coating, bake and development of photoresist on samples, 4" and 6" wafers.
- 1 coating station (Obducat QSC200BM with RCCT cover for samples 3mm to to 150 mm wafers)
- 1 development station (puddle)
- 1 SU8 programmable hotplate (Suss Microtec)
- 2 hotplates
Postes de travail de photolithographie
- 1 tournette (Obducat pour substrats 3mm à 150mm)
- 1 plaque chauffante SU8 (Suss Microtec)
- 1 station de développement manuel (bécher)
- 2 plaques chauffantes