Picture of wet bench III-V NoMOS(F-FRAI)
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Wet bench for the use of harmless chemicals, for instance etching of GaAs with citric acid/H2O2 mixtures

Tool name:
wet bench III-V NoMOS(F-FRAI)
Area/room:
Chimie / Chemistry (Bât F)
Category:
Procédés humides / Wet process benches
Manufacturer:
Coillard
Model:
to be checked

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