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wet bench III-V NoMOS(F-FRAI) (CHIM-10)

Current status:

DOWN

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Responsibles

1st Responsible:

Daniel FERRI ANGULO

2nd Responsible:

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Description

Wet bench for the use of harmless chemicals, for instance etching of GaAs with citric acid/H₂O₂mixtures

Details

Tool name:

wet bench III-V NoMOS(F-FRAI)

Area/room:

Chimie / Chemistry (Bât F)

Category:

Procédés humides / Wet process benches

Manufacturer:

Coillard

Model:

to be checked

Tool Modes

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