Picture of Four AET Reve (T-LPCV)
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Réacteur vertical de dépôt LPCVD de Si-poly dopé Bore.

Vertical LPCVD furnace for boron-doped Si-poly

Tool name:
Four AET Reve (T-LPCV)
Area/room:
Traitements thermiques/thermal treament (Bâts F et
Category:
LPCVD
Manufacturer:
AET
Model:
SEP - 28486
Max booking time, day:
8 hours
Max booking time, night:
8 hours
No. of future bookings:

Epaisseurs de dépôt de 1µm à 8µm. Température de dépôt: 490°C. Vitesse dépôt >30nm/mn.

Thickness between 1µm to 8µm. Deposit temperature: 490°C. Rate deposition >30nm/mn

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